Start and End Date
01 June 2010-01 May 2013
Coordinator
UNIVERSITY COLLEGE CORK - NATIONAL UNIVERSITY OF IRELAND, CORK (İrlanda)
Project Total Budget
4.7 Million Euro
Turkish Partners
Selçuk University
Supported Framework Program
7th Framework Programme Materials and Manufacturing Technologies

Scientific Outputs
- -Around 50 papers from the project were published,
- -Over 75 scientific presentations
- -Organized 2 international DSA meetings
- - Contributed to the ITRS Roadmap for Emerging materials
- -NANODOTS –A method for providing a nanopattern of metal oxide nanostructures on a substrate (Application No. 11189329-2222). -An antimicrobial food package (Application No. P10939EP00).
- -Software image analysis.
- -Sub-wavelength light diffraction techniques.
- -Desk top multipurpose nano-imprint lithography module.
Tackling ‘grand’ or societal challenges
- -Nanopattening methodology was developed for the creation of sub 10 nm feature size patterns over large areas (up to 8”).
- -Line and pillar patterns were realized.
- -A directed self-assembly techniques were integrated into manufacturing scale processes to realize functioning devices.
- -Chemically designed/tailored silsequioxane films could be coupled to a nanoiprint method to generate topographically ordered substrates to define precise pattern alignment and orientation.
- -New, block copolymer materials of controlled structure, dimension and function were synthesized and patterns at these were defined.
- -New metrology was developed to allow quantification of pattern defectivity.
- -Novel plasma etching techniques were used to transfer the pattern to the substrate surface and the device performance demonstrated. -Innovative characterisation techniques capable of studying both long and short range structure were developed.
Industrial Innovation (including innovation in services as well as products and processes)
- -Nanopattening methodology for the creation of sub 10 nm feature size patterns over large areas (up to 8”).
- -New, block copolymer materials of controlled structure, dimension and function were synthesized
- -New block copolymer patterns were defined.
- -New metrology was developed
- -Novel plasma etching techniques were used to transfer the pattern to the substrate surface and the device performance demonstrated.
Research-influenced changes in policy, agenda-setting
- -Technology roadmaps for nanopatterning and metrology
- -The development of inexpensive self-assembly based nanotechnologies for the semiconductor industries and ultra-fine patterning
The provision of Improved Public Goods
Development of nanopatterning technology and new block copolymer patterns for electronic industry
The improved exercise of professional skill
The academic groups involved in the project have significantly increased their scientific reputations
Human capital development
2 post-docs and 2 PhD students involved in the project